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31. March 2011 | Press Releases

PARC orders AIXTRON CCS MOCVD system for InGaAlN lasers and light emitting devices

AIXTRON SE announced today a new order for a Close Coupled Showerhead (CCS) MOCVD system from PARC, a Xerox company, in Palo Alto, CA, USA. The system will include the full set of advanced features such as the in-situ multichannel pyrometer ARGUS, high temperature growth, and gap adjustment for optimum (Al)GaN conditions in a wide pressure range.

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17. March 2011 | Press Releases

Beiji Haotian Technology upgrades power LED epi capacity with AIXTRON G4 and G5 systems

AIXTRON SE today announced an order for MOCVD reactors from new customer Beiji Haotian Technology Co., Ltd. The order for a total of five systems comprises two AIX 2800G4 HT deposition systems in the 42x2-inch configuration and three AIX G5 HT deposition systems in the 56x2-inch configuration. The Jiangsu, China-based company placed the order during the second quarter of 2010 and following delivery between the first and second quarter of 2011, the systems will be used for production of power chip LEDs.

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10. March 2011 | Press Releases

The CRP – Gabriel Lippmann from Luxembourg and AIXTRON explore novel markets with advanced polymer thin films

The Centre de Recherche Public (CRP) - Gabriel Lippmann, the leading research institute in Nanotechnologies in Luxembourg, and AIXTRON SE announced today the start of a cooperation agreement. The main goal of the new project is the mutual development of advanced polymer materials focusing on establishing a wide range of processes that contribute to the fabrication of advanced organic/inorganic materials.

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08. March 2011 | Press Releases

Finisar Corporation purchases AIXTRON MOCVD technology for next generation VCSEL production

AIXTRON SE today announced a new order for an MOCVD reactor from Finisar Corporation, USA, a company engaged in the manufacture of fiber optic subsystems and components for communication applications.

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