- / HOME
- / Investors
21. November 2018 | Press Releases
AIX G5+ C high-volume manufacturing platform paves way to high-performing 650V GaN-on-Si devices
Herzogenrath/Germany, November 21, 2018 – AIXTRON SE (FSE: AIXA), a worldwide leading provider of deposition equipment to the semiconductor industry, will deliver multiple AIX G5+ C MOCVD systems to InnoScience Technology Co., Ltd. (China) for the development of GaN (gallium nitride) power devices which are more and more favored over Si (silicon) power devices in various applications due to their superior performance at high frequency. All AIXTRON cluster tools will feature a 5x200 mm configuration and will be shipped until Q2/2019.
GaN power devices have very low conduction loss, switching loss and off state loss compared to the traditional Si-based power chips due to a higher breakdown strength, faster switching speed, higher thermal conductivity and lower on-resistance. GaN power devices are being used already today for applications such as efficient power supplies for PC and servers or LiDAR (Light Detection And Ranging) and wireless power transfer requiring high-speed switching higher than 1 MHz. In addition, they also have advantages for electric vehicles applications like On-Board Chargers (OBC) because of significantly reduced system size by superior thermal properties and reduction of the passive components.
In the scope of the increasing number of applications, AIXTRONs AIX G5+ C platform can play out its advantages in the manufacturing process since the system allows for scalable processes, tight uniformity and particle control of the epitaxial wafers to enable highest yield and maximum throughput at the lowest cost of ownership.
Jay Son, CEO of InnoScience Technology, says: "We have chosen the AIX G5+ C as it has proven to provide excellent thickness and wafer uniformity due to the superior capabilities of the Planetary® batch reactor concept. The newly acquired systems will enable us to ramp up manufacturing of our high-end products such as 650V GaN-on-Si1 devices with the best cost per wafer in the market."
"Market demand for power electronics, especially for GaN-based devices is picking up speed with AIXTRON having the most capable system available in the market. We are pleased that InnoScience leads the way in China and has decided to select this system which convinces not only by performance but also by making the production of GaN power devices commercially viable," comments Dr. Felix Grawert, President of AIXTRON SE.
1 GaN-on-Si = Gallium Nitride-on-Silicon
Our registered trademarks: AIXACT®, AIXTRON®, Atomic Level Solutions®, Close Coupled Showerhead®, CRIUS®, EXP®, EPISON®, Gas Foil Rotation®, Optacap™, OVPD®, Planetary Reactor®, PVPD®, STExS®, Trijet®
Alan Tai
Taiwan/Singapore
Christof Sommerhalter
USA
Christian Geng
Europe
Hisatoshi Hagiwara
Japan
Nam Kyu Lee
South Korea
Wei (William) Song
China
AIXTRON SE (Headquarters)
AIXTRON 24/7 Technical Support Line
AIXTRON Europe
AIXTRON Ltd (UK)
AIXTRON K.K. (Japan)
AIXTRON Korea Co., Ltd.
AIXTRON Taiwan Co., Ltd. (Main Office)
AIXTRON Inc. (USA)
Laura Preinich
Recruiter
Tom Lankes
Talent Acquisition Expert- Ausbildungsleitung
Christoph Pütz
Senior Manager ESG & Sustainability
Christian Ludwig
Vice President Investor Relations & Corporate Communications
Ralf Penner
Senior IR Manager
Christian Ludwig
Vice President Investor Relations & Corporate Communications
Prof. Dr. Michael Heuken
Vice President Advanced Technologies